Quality You Can Verify
Key Inspection Parameters
- Particle Size Distribution (PSD)
- Crystal Morphology
- Surface Condition
- Metallic Impurity Control
- Batch Consistency
RZ-A-C2011 (Superfine Diamond Micron Powder)
Product Characteristics:
Suitable for direct use in PDC manufacturing and diamond slurry applications. Used for lapping, grinding, and polishing of hard and brittle materials.
Recommended Applications:
Suitable for ultra-fine grinding and precision polishing of fine ceramics, IC chips, ferrite, quartz, gemstones, optical lenses, and other hard and brittle materials. Also used in wear-resistant composites, coatings, lubricants, and precision finishing applications.
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RZ-A-C2010 (High-Purity Diamond Micron Powder)
Product Characteristics:
Manufactured from high-purity, carefully selected diamond. Features ultra-clean particle surfaces with ppm-level metal impurity control. Features narrow PSD, a high proportion of blocky particle morphology, stable dispersion in both water- and oil-based systems, and high wear resistance.
Recommended Applications:
Suitable for direct use in PDC manufacturing and diamond slurry applications. Used for lapping, grinding, and polishing of hard and brittle materials.
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RZ-MB-C2009 (Diamond Micron Powder for Diamond Wire Applications)
Product Characteristics:
Manufactured from high-toughness MBD diamond with reshaping and precision grading processes. Features blocky particle morphology and narrow PSD with reduced oversized particles. Exhibits high wear resistance.
Recommended Applications:
Suitable for diamond wire manufacturing and cutting tools.
Used for grinding and polishing of silicon, quartz, LCD glass, semiconductors, gemstones, magnetic materials, and other hard and brittle materials.
Used for grinding and polishing of silicon, quartz, LCD glass, semiconductors, gemstones, magnetic materials, and other hard and brittle materials.
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RZ-PCD-C2407 (High-Purity Diamond Micron Powder for PCD Applications)
Product Characteristics:
Manufactured from high-strength MBD6 diamond. Features high particle circularity (≥0.95) and blocky particle morphology. Ultra-high purity with single-element impurity levels below 8 ppm and total impurities below 20 ppm. Exhibits high wear resistance.
Recommended Applications:
PCD and PDC tools, wire drawing dies, electroplated diamond tools, and ceramic-bonded and metal-bonded tools.
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RZ-PCD-C2203 (Diamond Micron Powder for PCD Applications)
Product Characteristics:
Manufactured from high-toughness MBD diamond with surface purification treatment. Features blocky particle morphology, high thermal stability, and high wear resistance. Designed for PCD/PDC sintering applications.
Recommended Applications:
Suitable for PCD and PDC tools, wire drawing dies, electroplated tools, and vitrified-bonded or metal-bonded tools.
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